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常压化学气相沉积法制备Ti_5Si_3薄膜及其镀膜玻璃
作者:黄燕飞 任招娣 沈美 杜军 魏德法 马宁 杜丕一  
单位:浙江大学材料系 硅材料国家重点实验室 杭州钢铁集团公司 威海蓝星玻璃股份有限公司  
关键词:常压化学气相沉积法  硅化钛  红外反射  透射率  电阻率 
分类号:O484.41
出版年,卷(期):页码:2009,37(10):1694-1699
DOI:
摘要:

<p>以制备兼具阳光控制和低辐射功能的镀膜玻璃为目的,以硅烷与四氯化钛为反应前驱体,氮气为保护气体和稀释气体,通过常压化学气相沉积法模拟玻璃浮法在线镀膜工艺,在玻璃基板上成功制备了Ti5Si3薄膜,用X射线衍射、场发射扫描电子显微镜、四探针测阻仪和分光光度计对薄膜的相结构、形貌、电学、光学性能进行了表征。结果表明:薄膜为六方结构的Ti5Si3晶相,晶相含量较高,晶粒尺寸为23nm,薄膜中的晶粒以200nm左右的多晶颗粒团聚体形式存在。薄膜电阻率为122&mu;&Omega;&middot;cm,与Ti5Si3晶体的本征电阻率相当。这种单层镀膜玻璃的红外反射率可高达92.1%,可见光区的透过率为25%,兼具阳光控制和低辐射功能。</p>

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<p>Ti5Si3 thin films were successfully prepared on glass substrate by atmospheric pressure chemical vapor deposition(APCVD) method,using SiH4 and TiCl4 as the precursors and N2 as the diluted and protective gas.The phase structure,surface morphology,sheet resistance and optical behaviors of the thin films were characterized by using X-ray diffraction,field emission scanning electron microscopy,four-point probes and spectroscopy.The results show that the Ti5Si3 crystalline phase with hexagonal structure is formed largely in the thin films.The dimensions of the phase particles are about 200 nm and these particles are aggregated by Ti5Si3 crystalline grains with a size of 23 nm.The resistivity of the thin film is 122 &mu;&Omega;&middot;cm,which corresponds to that of bulk Ti5Si3 crystalline phase.This single layer coated glass exhibits infrared-reflectance of 92.1% and visible transmittance of about 25%,having the property of low emissivity and the function of solar control.</p>

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基金项目:
国家自然科学基金(50672084)资助项目
作者简介:
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参考文献:

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