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N含量对CN薄膜折射率的影响
作者:乔学亮 孙增辉 程宇航 陈建国 熊锋 王洪水 邓德圣 
单位:华中科技大学塑性成型模拟及模具技术国家重点实验室 华中科技大学塑性成型模拟及模具技术国家重点实验室 华中科技大学塑性成型模拟及模具技术国家重点实验室 华中科技大学塑性成型模拟及模具技术国家重点实验室 华中科技大学塑性成型模拟及模具技术国家重点实验室 华中科技大学塑性成型模拟及模具技术国家重点实验室 华中科技大学塑性成型模拟及模具技术国家重点实验室 武汉430074  武汉430074  武汉430074  武汉430074  武汉430074  武汉430074  武汉430074 
关键词:氮化碳薄膜  折射率  结构  射频溅射沉积 
分类号:TB43
出版年,卷(期):页码:2003,31(5):465-469
DOI:
摘要:
采用射频磁控溅射法沉积了CN薄膜 ,利用XPS ,XRD ,FTIR等测试手段研究了CN薄膜的成分和结构。结果表明 :CN薄膜为非晶结构 ;CN薄膜中n(N) /n(C)随沉积室中N2 浓度的增加而增大 ,n(N) /n(C)最高可达到 0 .3 3 ;CN薄膜中主要含有CC ,C—C ,C—N ,CN ,C≡N等原子基团 ;N在CN薄膜中主要起稳定sp2 C的作用。利用椭圆偏振仪测量了CN薄膜的折射率和厚度。对薄膜的折射率与N含量之间关系的研究发现 :CN薄膜的折射率随n(N) /n(C)的增加而减小 ;CN薄膜的折射率由 2 .2减小到 1.8。
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CN films were deposited by radio frequency sputtering technique and the composition and structure of it were investigated by means of XPS, XRD and FTIR. The refractive indexes of CN films are measured with ellipsometric polarimeter. The results show that CN films are amorphous and n (N)/ n (C) in films increases with the increase of N 2 concentration in depositing chamber, which can reach to n (N)/ n (C) =0.33. There are radicals CC, C—C, C—N, CN, C≡N etc in the films. The sp 2 C content is stabilized with N content augment. Researching on the relationship between the refractive index and N content, it is found that the refractive index of CN films decreases with the increase of n (N)/ n (C) and it is changed from 2.2 to 1.8.
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基金项目:
总装备部预研基金;; 武汉市晨光基金资助项目
作者简介:
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参考文献:
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