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快速退火对磁控溅射制备Bi/Te多层膜热电性能的影响
作者:张建新1 2 3  楷2 杨庆新1 3 李海林2 韩变华2  亮2 
单位:(1. 天津工业大学 天津市电工电能新技术重点实验室 天津 300387  2. 天津工业大学 天津市光电检测技术与系统重点实验室 天津 300387  3. 天津工业大学 中空纤维膜材料与膜过程省部共建国家重点实验室 天津 300387) 
关键词:Bi/Te多层膜 热电薄膜 快速退火 热电性能 量子化效应 
分类号:TN304
出版年,卷(期):页码:2018,46(7):0-0
DOI:
摘要:

采用磁控溅射法在玻璃衬底上室温沉积Bi/Te多层膜,并在常压氮气保护下进行快速退火处理。研究退火温度和时间对薄膜的显微结构、物相组成和热电性能的影响。结果表明:随退火时间的延长样品中依次出现片状晶粒的成核、定向生长和横向堆叠等结构的演变特征,使晶粒沿横向逐渐增厚,且退火温度越高,结构演变速率越快。退火样品以Bi2Te3为主相,350~400 ℃退火使薄膜表层生成少量Bi-Te氧化物。随退火时间的延长,与晶粒堆叠厚度相关的量子化效应显现,使薄膜的热电性能出现明显的振荡现象。在350 ℃退火11~17 min的薄膜,可获得稳定的高功率因数,最大值为21.91 μW/(K2·cm)。

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参考文献:
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